Pall Corp. Introduces Argon Gas Purification System at Intersolar North America 2012

At Intersolar North America, Pall Corp. will introduce the Gaskleen(R) PG44000 purification system, developed for the removal of moisture, oxygen and hydrocarbons to sub-ppb levels from bulk argon gas.

PORT WASHINGTON, N.Y.–(BUSINESS WIRE)–Pall Corporation (NYSE: PLL) will showcase a new argon gas purification system and other filtration and contamination control products for the photovoltaic (PV) industry at Intersolar North America in San Francisco, July 10 -12. The exhibition is a leading forum for energy companies and equipment suppliers to explore technologies and methods to propagate solar as a significant, viable energy source. Pall’s featured products, including a water reclaim system, are designed to help increase yield, reduce cost of ownership, and decrease water usage in solar cell manufacturing.

Purification of the process gases utilized in solar cell production is critical to enhancing yields and conversion efficiency. At the show, Pall will introduce the Gaskleen® PG44000 purification system, developed for the removal of moisture, oxygen and hydrocarbons to sub-parts-per-billion (ppb) levels from bulk argon gas. An integrated filter provides exceptional particle removal efficiency. The system can operate at 1.7 MPa / 250 psi and can be designed for up to 4,000 L/min, making it ideal for argon recycling. Smaller, point-of-use, argon purifier assemblies containing the same AresKleenTM INP medium are also available for Czochralski (CZ) puller applications.

Among the other products on display will be Gaskleen purifier assemblies with AresKleen HCLP medium, which has proven highly effective in removing trace moisture to < 15 ppb from HCl gas. The gas is used in the formation of trichlorosilane, a key ingredient in the production of polysilicon, which is used to make most solar cells as well as semiconductor wafers.

Pall will also present its fully automatic Water Reclaim System for recovering over 90 percent of deionized water used during silicon ingot shaping. The system efficiently and economically removes the resultant silicon fines without the need for chemical additives, providing essentially particle-free water for cost-effective recycling. A major supplier of shaping and grinding tools for the solar industry highly recommends this reclaim system.